Patriot Awarded U.S. Patent


       

Alexandria, Virginia, 16 December 2003

Patriot Antenna Systems, Inc. has been awarded a United States Patent for it's new method of manufacturing high precision antenna systems.  In production, Patriot can hold tolerances of  better than to 0.007 of an inch with this new vacuum forming dual skin process.  In addition to the extremely accurate nature of the process, the finished reflector is lighter and more durable than anything in the industry.

1.8 meter antenna

 

The process can be applied to virtually any reflector size, and has already made its way into the satellite market via Patriot’s new SNG and flyaway antenna systems.  Patriot intends to market this process and/or license this process to companies that need a lighter, more accurate terminal for applications such as military and Ka-Band Systems.

1.2 meter antenna

         

Contact your sales representative today for more info on all Patriot products.
Click here if you are unable to view this image
www.sepatriot.com Contact Patriot direct: info@sepatriot.com

         
         

U.S. Patent 6,664,939