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Patriot Awarded U.S. Patent |
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Alexandria, Virginia, 16 December 2003 Patriot Antenna Systems, Inc. has been awarded a United States Patent for it's new method of manufacturing high precision antenna systems. In production, Patriot can hold tolerances of better than to 0.007 of an inch with this new vacuum forming dual skin process. In addition to the extremely accurate nature of the process, the finished reflector is lighter and more durable than anything in the industry. |
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1.8 meter antenna |
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The process can be applied to virtually any reflector size, and has already made its way into the satellite market via Patriot’s new SNG and flyaway antenna systems. Patriot intends to market this process and/or license this process to companies that need a lighter, more accurate terminal for applications such as military and Ka-Band Systems. |
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1.2 meter antenna |
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Contact your sales representative today for more info on all Patriot
products. |
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U.S. Patent 6,664,939
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